| Abstract |
Access is offered to advanced micro- and nanotechnology device processing environments for microwave and photonic devices and for nanotechnology at the Department of Microtechnology and Nanoscience (MC2) at Chalmers University of Technology in Göteborg, Sweden. The laboratory provides means to develop process steps, process sequences, and components in small/medium quantities. In 1240 m2 clean-room area more than 150 tools are available, including two e-beam lithography systems (one of which is a JBX 9300FS from JEOL with a spot diameter of 4 nm and a minimum feature size of below 10 nm), silicon processing on up to 150 mm wafers, III-V and wide bandgap processing, molecular beam epitaxy, CVD and dry etching systems.
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