Multilayered honeycomb panel (5) composed of a honeycomb core (3) and two skins (4) from composite material with glass or carbon fibers in a thermoplastic polymer matrix. The honeycomb core (3) is made from a single tape from the same composite material wound in successive layers thus forming a characteristic grid shape which is composed of equilateral triangles. In the triangular gaps formed by the winding of the longitudinal reinforcement (1) triangular prismatic cells are bonded made from the same material with fiber reinforcement at ±45° to the vertical thus forming the honeycomb core through autogenous bonding. On both flat surfaces of this core two skins (4) made from the same U-D reinforced material are placed and bonded again autogenously forming the desired panel. Further reinforcement of the matrix can be achieved with the insertion of suitably arranged carbon nanotubes. Due to the materials, the geometry and the manufacturing method the proposed panel exhibits higher shear, flexural and compressive strength to weight ratio than the existing panels with similar reinforcement.

There is provided a lighting system having a high spatial resolution appropriate to a high-frequency component by evanescent waves in a negative refraction lens. The lighting system includes a light emitter thin film (106) which includes a light emitting material which emits light when an energy is applied, a cathode (101) for applying an electron beam (102) which is the energy, to the light emitter thin film (106), and a negative refraction lens (110) which is formed of a material exhibiting negative refraction, and has an optical system for projecting light emitted from the light emitter thin film (106), on an object.

The specification describes a method for selectively depositing carbon nanotubes on the end face of an optical fiber. The end face of the optical fiber is exposed to a dispersion of carbon nanotubes while light is propagated through the optical fiber. Carbon nanotubes deposit selectively on the light emitting core of the optical fiber.

Methods for etching a metal layer using an imprinted resist material are provided. In one embodiment, a method for processing a photolithographic reticle includes providing a reticle (122) having a metal photomask layer (320) formed on an optically transparent substrate (310) and an imprinted resist material deposited on the metal photomask layer, etching recessed regions (398) of the imprinted resist material to expose portions of the metal photomask layer in a first etching step, and etching the exposed portions of the metal photomask layer through the imprinted resist material in a second etching step, wherein at least one of the first or second etching steps utilizes a plasma formed from a processing gas comprising oxygen, halogen and chlorine containing gases. In one embodiment, the process gas is utilized in both the first and second etching steps. In another embodiment, the first and second etching steps are performed in the same processing chamber (100).

An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.