NATAL aims to develop a new core technology of powerful and compact laser sources for the visible and ultraviolet spectral ranges. Such devices are needed for a variety of applications including nano-materials processing, medicine, RGB displays, life sciences, as well as UV lithography and surface chemistry. The lasers envisaged by NATAL represent a radical departure from the existing technologies. Nanophotonic materials and science are the key themes running throughout the proposed programme. The main areas addressed by NATAL include (i) development of innovative nano-structured gain devices (ii) development of advanced micro-optical elements to enable the functionality and control of lasers. Central focus of this programme is the concept of the Optically-Pumped Vertical External Cavity Surface-Emitting Semiconductor Laser (OP-VECSEL). These sources retain the power-scaling, beam quality and intracavity control capability of solid-state lasers, while offer the wavelength versatility, broadband pump absorption and compact gain region supplied by semiconductor technology. NATAL will use the innovative thermally-conductive optical windows bonded directly to the surface of the OP-VECSEL chip. This approach allows to facilitate wavelength extension and power scaling, microchip operation and novel schemes for optical mode control, in addition to integrated device formats with a wide range of functionality. Specific wavelength targets include direct operation in the red (630-670 nm) and frequency-doubled OP-VECSELs operating at 315-335 nm (UV), 470 nm (blue), 520 nm (green), and 610 nm (red). These wavelengths cover important absorption bands in a host of materials significant to nanotechnology (quantum dot and conventional fluorphores, light-emitting polymers, photoresists, biomaterials) and large scale consumer applications.

Insulin resistance, the key feature of the metabolic syndrome, not only causes type 2 diabetes but also gives rise to its deadliest complications - the cardiovascular disease. A key factor in the development of insulin resistance is the accumulation of triglycerides in liver and muscle, a process that seems to be highly regulated. NACARDIO is a multidisciplinary project aiming to develop and commercialise a nano-biosensor technology, capable of analysing extremely small amounts of protein in small sample volumes. The technology can be used to quantify proteins involved in lipid storage to investigate if any of these proteins are potential biomarkers for the development of insulin resistance and cardiovascular disease. The sensor technology is based on single electron tunnelling (SET), a phenomenon well explored for low temperature applications. State of the art nanofabrication utilising metallic nanoparticles now make this technology platform available for room temperature operation. SET-technology provides unique possibilities for biosensing. Direct electrical detection can be made with sensitivity greater than for any other existing or proposed technique. To achieve the goals of NACARDIO, extensive multidisciplinary work addressing questions at the interface between nanotechnology, physics, electrical engineering, surface chemistry, biotechnology and medical sciences will be performed. Frontline experimental approaches encompassing peptide-stabilised gold nanoparticles, electron-beam lithography, nano-imprint, molecular self-assembly, engineered antibody-fragments, protein expression and fluidic simulations will be employed to fabricate the sensor and ensure biological functionality and usability. The efforts will result in a technology that not only revolutionises cardiovascular research and diagnostics, but also promotes other innovative approaches including analyses of extremely small sample (e.g. single-cell) and real-time monitoring of cell-signalling.

Molecular scale interactions at artificial and naturally occurring responsive surfaces, e.g. the cell membrane, play a crucial rolein many biological and biomedical processes. Responsive surfaces with molecular level control are considered as key to manycrucial problems in nanobiotechnology. We aim at contributing to the development of such surfaces starting from afundamental understanding of structure-property relationships in advanced nanomaterials and processes from the molecularscale. Specifically we propose to investigate the translation of external stimuli into forces in single macromolecules by meansof atomic force microscopy (AFM) measurements for two classes of stimuli-responsive polymers, i.e. unique redox-activeorganometallic poly(ferrocenylsilanes) and elastin-based biopolymers. The communication with single molecules occurs viaconformational/dimensional changes of these polymers under stress via changes in chain torsional potential energy landscapeand thus variations in the corresponding macromolecular characteristic ratio. These occur upon redox stimulation or uponchanges in e.g. temperature or pH. The challenging project will be tackled in a rational manner (control instead of trial anderror) by depositing molecules individually at precisely defined positions using scanning probe lithography. Subsequently, thenanomechanical properties of an ensemble of individually addressable molecules will be probed molecule for molecule bysingle molecule force spectroscopy, hence avoiding a convolution of data of many molecules. This approach will also beutilized to selectively pick up individual macromolecules by chemically functionalized tips, followed by AFM measurements thataim at unraveling the effects of several external stimuli on the macromolecules response. Based on the results, responsivesurfaces with molecular level control can be designed for applications in the areas of (bio)sensors, drug delivery,nano/microfluidics, and smart coatings.

Nanotechnology is expected to have a big impact on most of our life. Nanostructred materials become more and more important in various fields such as nanoelectronics, information storage technology etc. At the nanometer scale, i.e. 1-100 nm, material properties are clearly size dependent and new properties are expected. Among functional materials nanoscale ferroelectrics can have a major role because they can be applied in different fields such as sensors, actuators, memory devices and optics. However they cannot be applied to nanometer scale devices before the influence of the lateral size on physical properties will be clarified.In order to find answer for the problems there is a need to have good quality nanoscale structures. It is a challenge to fabricate such structures in this range using both lithography (¿top¿down¿ approach) and self-assembling and self-patterning methods (¿bottom¿up¿ approach). Whereas conventional lithographic systems work usually with a resolution of about 100 nm the bottom-up approaches allow the inexpensive fabrication of structures with size of 10-20 nm. The main goal of the work is preparation of nanosized ferroelectric crystals by self-assembling methods. Successful strategies and routes have been developed to synthesize nanoscale materials of numerous simple systems such as semiconductors or metals. Complex systems such as ferroelectric oxides are not yet systematically addressed, despite of the possibility of discovering new materials with unique properties. Physical route based on the concept of microstructural instability of ultrathin films and chemical routes will be applied to obtain different perovskite crystals. A good quality of nanostructures that lateral dimension can be tuned in nanometer range is expected to fabricate and in future this will allow investigating structure-property relations (e.g. by transmission electron microscopy and piezoresponse force microscopy) and solve ¿size effects¿ problem.

The growing importance of nanotechnology for the European Research Area is reflected in the FP6 Thematic Priorities. It is foreseen that most of the projects submitted to the Priority Area 3 (NMP) will need and develop nanopatterning techniques in one way or another. The Emerging Nanopatterning Methods (NaPa) consortium integrates the new patterning methods into one project, both anticipating and responding to the increasing need for technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. The NaPa consortium complements the deep UV technology by providing low-cost scalable processes and tools to cover the needs of nanopatterning from CMOS back-end processes through photonics to biotechnology. To achieve this, research in three technology strands is proposed: nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning. While the former is at a crucial embryonic stage, requiring prompt consolidation to yield its first products in one or two years, the other two will result in applications towards the end of the project. Research in three overarching themes required by all strands: Materials, Tools and Simulation will be undertaken. NaPa brings together 35 leading academic and industrial European institutions with a vast amount of recent know-how on nanofabrication, partly developed within FP5. In total, 3500 person months will be contributed by the partners to the project. Complementing R&D, the consortium will design exciting nanoscience and nanoengineering courses to advance the training of the next generation of scientists and engineers and to create a positive attitude towards science among young people. Dissemination activities towards the lay public and sectors underrepresented in nanotechnology form an integral part in NaPa. Thus, NaPa offers a unique opportunity to unleash the potentials of #

Nano-templates fabricated from chemically stable, resistant materials provide a flexible basis for a range of fabrication technologies including forming, moulding, imprinting and hot embossing. The purpose of this proposal is to establish large-area novel nano-forming technologies based on patterning porous anodised alumina (Al2O3) and their application to the fabrication of organic solar cell devices, quantum dot based photonic LEDs/Lasers and photonic crystal structure elements. The specific aims are 1. To research and develop technologies compatible with semiconductor microfabrication technologies for nano-patterning using porous anodised alumina or titania thin films, to form arrays of ultra-small structures; 2. To apply porous anodised alumina nano-masking and nano-imprinting to selective area epitaxial growth, to produce GaN quantum dots of unparalleled size uniformity for enhanced light emitting devices and lasers; 3. To apply anodised nano-templates to the fabrication of novel high-aspect ratio photonic devices by nano-imprint lithography; 4. To apply self-ordered porous alumina nano-templates to the mass market fabrication of two-dimensional and three-dimensional photonic crystal structure devices in semiconductors, dielectrics and polymers. Meeting each aim will involve a detailed, multi-disciplinary programme of microfabrication and materials and device characterisation.

Spintronics, in which both the spin and the charge of the electron are used, is one of the most exciting new disciplines to emerge from nanoscience. The 3SPIN project seeks to open a new research front within spintronics: namely 3-dimensional spintronics, in which magnetic nanostructures are formed into a 3-dimensional interacting network of unrivalled density and hence technological benefit. 3SPIN will explore early-stage science that could underpin 3-dimensional metallic spintronics. The thesis of the project is: that by careful control of the constituent nanostructure properties, a 3-dimensional medium can be created in which a large number of topological solitons can exist. Although hardly studied at all to date, these solitons should be stable at room temperature, extremely compact and easy to manipulate and propagate. This makes them potentially ideal candidates to form the basis of a new spintronics in which the soliton is the basic transport vector instead of electrical current. ¬3.5M of funding is requested to form a new team of 5 researchers who, over a period of 60 months, will perform computer simulations and experimental studies of solitons in 3-dimensional networks of magnetic nanostructures and develop a laboratory demonstrator 3-dimensional memory device using solitons to represent and store data. A high performance electron beam lithography system (cost 1M¬) will be purchased to allow state-of-the-art magnetic nanostructures to be fabricated with perfect control over their magnetic properties, thus allowing the ideal conditions for solitons to be created and controllably manipulated. Outputs from the project will be a complete understanding of the properties of these new objects and a road map charting the next steps for research in the field.

In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now the driving solution to deal with all industry concerns. Nevertheless, this solution becomes less effective for each new technology node. Effectively, it requires more and more complex and expensive masks due to the introduction of optical proximity correction and phase shift techniques. The blow up of the tool price plays also an important role in the overall cost of ownership of this technique. This trend opens opportunities for the Mask-Less Lithography (ML2) technology, based on multi-beam principles and developed by the two European companies MAPPER and IMS Nanofabrication AG. The cost effective model of the ML2 option in association with the high resolution capability of the electron lithography and a reasonable throughput target represents an attractive alternative for lithography and is supported by some key CMOS manufacturers around the world, like TSMC, STMicroelectronics, QIMONDA, TOSHIBA, and Texas Instruments…_x000d_

The objective of the project is to realise high-performance organic electronic devices and circuits using large-area processing compatible fabrication methods. The high performance of the organic circuits referred to here means high speed (kHz-MHz range), low parasitic capacitance, low operating voltage, and low power consumption. The related organic thin film transistor (OTFT) fabrication development will be focused to enable a high resolution nanoimprinting lithography (NIL) step, which is compatible with roll-to-roll processing environment. Applying NIL will enable smaller transistor channel lengths (down below 1 µm) and thereby an increase in the speed of the device. Another important concept to improve the performance is the self-aligned fabrication principle, in which the critical patterns of the different OTFT layers are automatically aligned in respect to each other during the fabrication. This decreases the parasitic capacitances and thereby increases the speed of the device, and is one of the key elements to enable the use of large-area fabrication techniques such as printing. Also complementary transistor technology will be developed, which will enable a decrease in operating voltage and power consumption. The high performance organic transistors will be tested in basic electronic building blocks such as inverters and ring oscillators. The technology development will be exploited in the active matrix liquid crystal display (AMLCD) and radio-frequency identification (RFID) demonstrators. In addition to showing that sufficient performance can be reached without sacrificing the mass fabrication approach, solutions for the fabrication of roll-to-roll tools in order to make serial replication viable will be provided. Finally, the design, characterization, and modeling of submicron low-power OTFTs will be done in order to support the fabrication of the demonstrators based on the technology developed in the project.

To extend beyond existing limits in nanodevice fabrication, new and unconventional lithographic technologies are necessary to reach Single Nanometer Manufacturing (SNM) for novel ‘Beyond CMOS devices’. Two approaches are considered: scanning probe lithography (SPL) and focused electron beam induced processing (FEBIP). Our project tackles this challenge by employing SPL and FEBIP with novel small molecule resist materials. The goal is to work from slow direct-write methods to high speed step-and-repeat manufacturing by Nano Imprint Lithography (NIL), developing methods for precise generation, placement, metrology and integration of functional features at 3 - 5 nm by direct write and sub-10nm into a NIL-template. The project will first produce a SPL-tool prototype and will then develop and demonstrate an integrated process flow to establish proof-of-concept ‘Beyond CMOS devices’ employing developments in industrial manufacturing processes (NIL, plasma etching) and new materials (Graphene, MoS2). By the end of the project: (a) SNM technology will be used to demonstrate novel room temperature single electron and quantum effect devices; (b) a SNM technology platform will be demonstrated, showing an integrated process flow, based on SPL prototype tools, electron beam induced processing, and finally pattern transfer at industrial partner sites. An interdisciplinary team (7 Industry and 8 Research/University partners) from experienced scientists will be established to cover specific fields of expertise: chemical synthesis, scanning probe lithography, FEBIP-Litho, sub-3nm design and device fabrication, single nanometer etching, and Step-and-Repeat NIL- and novel alignment system design. The project coordinator is a University with great experience in nanostructuring and European project management where the executive board includes European industry leaders such as IBM, IMEC, EVG, and Oxford Instruments.